Advances in Imaging and Electron Physics

Advances in Imaging and Electron Physics merges two long-running serials-Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

- Discusses Spectral Color Spaces
- Covers Phase Contrast Enhancement with Phase Plates in Electron Microscopy
- Studies the Optical Properties of Gas Phase Field Ionization Sources
- Looks at Symmetric and Nonsymmetric Divergence Measures and Their Generalizations
- Describes the features and future of the International System of Units (SI)
- Illustrates Importance Sampling Hough Transform

Chapter 1 - Spectral Color Spaces: Their Structure and Transformations (LENZ);

Chapter 2 - Phase Contrast Enhancement with Phase Plates in Electron Microscopy (NAGAYAMA);

Chapter 3 - A Study of Optical Properties of Gas Phase Field Ionization Sources (LIU and Orloff);

Chapter 4 - On Symmetric and Nonsymmetric Divergence Measures and Their Generalizations (TANEJA);

Chapter 5 - Features and Future of the International System of Units (SI) (VALDES);

Chapter 6 - The Importance Sampling Hough Transform (WALSH)