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Principles of Vapor Deposition of Thin Films
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  • Principles of Vapor Deposition of Thin Films
ID: 174454
Professor K.S. Sree Harsha
Wycofany
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.

Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.

* Offers detailed derivation of important formulae.
* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.
* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

174454

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