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Handbook of Physical Vapor Deposition (PVD) Processing
ID: 172757
Donald M. Mattox
This updated version of the handbook further explains all aspects of the physical deposition process (PVD), the post-deposition processing. The emphasis of the new edition is the most important thing for you.
The book covers seldom treated in the literature; The book also covers the subject of individual deposition processes. However, the author is uniquely aware of these issues in the literature. In conclusion of the film and the resulting film properties. The author of the concept of the development of the process of creating problems. He uses actual experiences, called "war stories", to emphasize certain points. Special formatting for the reader is a subject of interest. The author has tried to make the most of the reader. Extensive references allow the reader to pursue.
The book is intended for those who are new to the field. The discussion of transferring technology between the R & D and manufacturing process. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Conditions.
Fully revised and updated to include the latest developments in PVD process technology
'War stories' drawn from the author's inspiration
Appendices include listings of periodicals and professional societies, and acronyms on R & D and manufacturing
Introduction; Substrate ("Real") Surfaces and Surface Modification; The "Good" Vacuum (Low Pressure) Processing Environment; The Sub-Atmospheric Processing Environments; The Low-Pressure Plasma Processing Environment; Vacuum Evaporation and Vacuum Deposition; Physical Sputtering and Sputter Deposition (Sputtering); Arc Vapor Deposition; Ion Plating and Ion Beam Assisted Deposition; Atomistic Film Growth and Some Growth-Related Film Properties; Film Characterization and Some Basic Film Properties; Adhesion and Deadhesion; cleaning; External Processing Environment; Transfer of Technology from R & D to Manufacturing
The book covers seldom treated in the literature; The book also covers the subject of individual deposition processes. However, the author is uniquely aware of these issues in the literature. In conclusion of the film and the resulting film properties. The author of the concept of the development of the process of creating problems. He uses actual experiences, called "war stories", to emphasize certain points. Special formatting for the reader is a subject of interest. The author has tried to make the most of the reader. Extensive references allow the reader to pursue.
The book is intended for those who are new to the field. The discussion of transferring technology between the R & D and manufacturing process. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Conditions.
Introduction; Substrate ("Real") Surfaces and Surface Modification; The "Good" Vacuum (Low Pressure) Processing Environment; The Sub-Atmospheric Processing Environments; The Low-Pressure Plasma Processing Environment; Vacuum Evaporation and Vacuum Deposition; Physical Sputtering and Sputter Deposition (Sputtering); Arc Vapor Deposition; Ion Plating and Ion Beam Assisted Deposition; Atomistic Film Growth and Some Growth-Related Film Properties; Film Characterization and Some Basic Film Properties; Adhesion and Deadhesion; cleaning; External Processing Environment; Transfer of Technology from R & D to Manufacturing
172757
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Donald M. Mattox